Title :
Realization and Evaluation of an Ultra Low-Voltage/Low-Power 0.25um (n+/p+) Dual-Workfunction CMOS Technology
Author :
Schwalke, U. ; Berthold, J. ; Bourenkov, A. ; Eisele, M. ; Krieg, R. ; Narr, A. ; Schumann, D. ; Seibert, R. ; Thanner, R.
Author_Institution :
Siemens, Corp. R&D, Microelectronics, Germany
fDate :
22-24 September 1997
Keywords :
Annealing; Boron; CMOS technology; Circuits; Energy consumption; Isolation technology; Low voltage; MOS devices; Microelectronics; Research and development;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194405
