• DocumentCode
    1908892
  • Title

    Realization and Evaluation of an Ultra Low-Voltage/Low-Power 0.25um (n+/p+) Dual-Workfunction CMOS Technology

  • Author

    Schwalke, U. ; Berthold, J. ; Bourenkov, A. ; Eisele, M. ; Krieg, R. ; Narr, A. ; Schumann, D. ; Seibert, R. ; Thanner, R.

  • Author_Institution
    Siemens, Corp. R&D, Microelectronics, Germany
  • fYear
    1997
  • fDate
    22-24 September 1997
  • Firstpage
    220
  • Lastpage
    223
  • Keywords
    Annealing; Boron; CMOS technology; Circuits; Energy consumption; Isolation technology; Low voltage; MOS devices; Microelectronics; Research and development;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1997. Proceeding of the 27th European
  • Print_ISBN
    2-86332-221-4
  • Type

    conf

  • DOI
    10.1109/ESSDERC.1997.194405
  • Filename
    1503335
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1908892