DocumentCode :
1909027
Title :
In situ pseudo-MOS transistor in as-grown silicon on insulator wafers
Author :
Williams, S. ; Cristoloveanu, S.
Author_Institution :
Laboratoire de Physique des Composants Ã\xa0 Semiconducteurs (UA-CNRS), INPG, ENSERG, BP 257, 38016 Grenoble Cedex, France.
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
195
Lastpage :
198
Abstract :
As-grown silicon on insulator materials are analysed using an in situ pseudo-MOS transistor. The measurement set-up and typical transistor characteristics are discussed. Fundamental parameters relating to the Si film, buried oxide and Si-SiO2 interface can be extracted from the operational curves of the pseudo-MOS transistor.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5435344
Link To Document :
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