DocumentCode
1909102
Title
Quadrupole-mass-spectroscopy studies on hot filament chemical vapor deposition of carbon films with nano-sized constituents
Author
Seungho Choi ; Soonil Lee ; Ken Ha Koh
Author_Institution
Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon, South Korea
fYear
2003
fDate
7-11 July 2003
Firstpage
169
Lastpage
170
Abstract
We used a quadrupole mass spectrometer (QMS) to investigate the dissociation of source gases and the variation of the gas-pahse precursors during the HFCVD process. Since the HFCVD pressure was about 30 Torr, a capillary was installed to sample the gas from the HFCVD chamber while maintaining the QMS at high vacuum. An investigation of the systematic variations in mass spectra corresponding to the increase of methane concentration in the ammonia-free feed gases revealed substantial generation of species containing two carbon atoms. However, an increase of ammonia concentration in the feed gas with 20% of methane resulted in generation of nitrogen containing radicals such as CN and HCN together with the suppression of two-carbon radicals. An implication of observed mass-spectrum variation for the growth behavior of carbon nanotube (CNT) and/or carbon nanoparticle (CNP) films was discussed.
Keywords
carbon nanotubes; chemical vapour deposition; dissociation; mass spectra; nanoparticles; thin films; 30 torr; C; ammonia free feed gases; carbon atoms; carbon films; carbon nanoparticle; carbon nanotube; carbon radicals; dissociation; hot filament chemical vapor deposition; methane; nitrogen; quadrupole mass spectra; Atomic measurements; Carbon nanotubes; Chemical technology; Chemical vapor deposition; Feeds; Gases; Hydrogen; Mass spectroscopy; Vacuum systems; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location
Osaka, Japan
Print_ISBN
4-8181-9515-4
Type
conf
DOI
10.1109/IVMC.2003.1223037
Filename
1223037
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