Title :
From SOI wafer to micro electron field emission device with focus lenses
Author :
Minh, P.N. ; Ono, T. ; Sato, N. ; Mimura, H. ; Yokoo, K. ; Esashi, M.
Abstract :
In this paper, we report on the fabrication and characterization of a monolithic microelectron field emitter array with focus on SOI (silicon on insulator) wafer. An array of cylindrical electrostatic lens array was formed at Si substrate of the SOI wafer by photolithography and dry etching techniques.
Keywords :
electron field emission; electrostatic lenses; field emitter arrays; photolithography; silicon-on-insulator; sputter etching; SOI wafer; Si substrate; dry etching; electrostatic lens array; focus lenses; micro electron field emission device; monolithic microelectron field emitter array; photolithography; silicon on insulator; Carbon nanotubes; Electric breakdown; Electron beams; Electron emission; Fabrication; Focusing; Lenses; Lithography; Numerical analysis; Silicon on insulator technology;
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
DOI :
10.1109/IVMC.2003.1223042
