From SOI wafer to micro electron field emission device with focus lenses

Author

Minh, P.N. ; Ono, T. ; Sato, N. ; Mimura, H. ; Yokoo, K. ; Esashi, M.

fYear

2003

fDate

7-11 July 2003

Firstpage

179

Lastpage

180

Abstract

In this paper, we report on the fabrication and characterization of a monolithic microelectron field emitter array with focus on SOI (silicon on insulator) wafer. An array of cylindrical electrostatic lens array was formed at Si substrate of the SOI wafer by photolithography and dry etching techniques.

Keywords

electron field emission; electrostatic lenses; field emitter arrays; photolithography; silicon-on-insulator; sputter etching; SOI wafer; Si substrate; dry etching; electrostatic lens array; focus lenses; micro electron field emission device; monolithic microelectron field emitter array; photolithography; silicon on insulator; Carbon nanotubes; Electric breakdown; Electron beams; Electron emission; Fabrication; Focusing; Lenses; Lithography; Numerical analysis; Silicon on insulator technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International

Conference_Location

Osaka, Japan

Print_ISBN

4-8181-9515-4

Type

conf

DOI

10.1109/IVMC.2003.1223042

Filename

1223042

Link To Document

https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1909280