• DocumentCode
    1909566
  • Title

    Applications of Scanning Tunneling Microscopy to the Characterization of Semiconductor Technologies and Devices

  • Author

    Salemink, H. ; Álbrektsen, O.

  • Author_Institution
    IBM Research Division, Zurich Research Laboratory, 8803 Rÿschlikon, Switzerland
  • fYear
    1991
  • fDate
    16-19 Sept. 1991
  • Firstpage
    101
  • Lastpage
    108
  • Abstract
    In semiconductor surface research, the scanning tunneling microscope (STM) has been applied primarily to the study of the structural and electronic on figurations of elemental group IV surfaces on the atomic scale. Several investigations are reported on semiconductor compound substrates such as GaAs and adsorbates. The interest in epitaxially grown layers is growing, both on the growth plane and in cross sections. This survey will review essentials of elemental surfaces and then focus on growth-related STM work, notably epitaxy and cross sections of III-V compound multilayers. Examples of p-n junctions, interfacial regions and electronic structure across interfaces will be discussed, and a comparison with other spectroscopic and electron-microscopic techniques will be made.
  • Keywords
    Atomic layer deposition; Epitaxial growth; Gallium arsenide; III-V semiconductor materials; Nonhomogeneous media; P-n junctions; Scanning electron microscopy; Spectroscopy; Substrates; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
  • Conference_Location
    Montreux, Switzerland
  • Print_ISBN
    0444890661
  • Type

    conf

  • Filename
    5435364