DocumentCode :
1909566
Title :
Applications of Scanning Tunneling Microscopy to the Characterization of Semiconductor Technologies and Devices
Author :
Salemink, H. ; Álbrektsen, O.
Author_Institution :
IBM Research Division, Zurich Research Laboratory, 8803 Rÿschlikon, Switzerland
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
101
Lastpage :
108
Abstract :
In semiconductor surface research, the scanning tunneling microscope (STM) has been applied primarily to the study of the structural and electronic on figurations of elemental group IV surfaces on the atomic scale. Several investigations are reported on semiconductor compound substrates such as GaAs and adsorbates. The interest in epitaxially grown layers is growing, both on the growth plane and in cross sections. This survey will review essentials of elemental surfaces and then focus on growth-related STM work, notably epitaxy and cross sections of III-V compound multilayers. Examples of p-n junctions, interfacial regions and electronic structure across interfaces will be discussed, and a comparison with other spectroscopic and electron-microscopic techniques will be made.
Keywords :
Atomic layer deposition; Epitaxial growth; Gallium arsenide; III-V semiconductor materials; Nonhomogeneous media; P-n junctions; Scanning electron microscopy; Spectroscopy; Substrates; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5435364
Link To Document :
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