DocumentCode
1909647
Title
The electrical characteristic dependence of reactive plasma evaporated copper phthalocyamne film on the NO/sub x/ gas absorption.
Author
Choi, C.G. ; Lee, W.J. ; Lee, S.C.
Author_Institution
KAIST
fYear
1994
fDate
24-29 July 1994
Firstpage
637
Lastpage
637
Keywords
Copper; Electric variables; Gas detectors; Metal-insulator structures; Plasma materials processing; Plasma measurements; Plasma properties; Schottky diodes; Semiconductor diodes; Semiconductor films;
fLanguage
English
Publisher
ieee
Conference_Titel
Science and Technology of Synthetic Metals, 1994. ICSM '94. International Conference on
Conference_Location
Seoul, Korea
Type
conf
DOI
10.1109/STSM.1994.836008
Filename
836008
Link To Document