• DocumentCode
    1909647
  • Title

    The electrical characteristic dependence of reactive plasma evaporated copper phthalocyamne film on the NO/sub x/ gas absorption.

  • Author

    Choi, C.G. ; Lee, W.J. ; Lee, S.C.

  • Author_Institution
    KAIST
  • fYear
    1994
  • fDate
    24-29 July 1994
  • Firstpage
    637
  • Lastpage
    637
  • Keywords
    Copper; Electric variables; Gas detectors; Metal-insulator structures; Plasma materials processing; Plasma measurements; Plasma properties; Schottky diodes; Semiconductor diodes; Semiconductor films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Science and Technology of Synthetic Metals, 1994. ICSM '94. International Conference on
  • Conference_Location
    Seoul, Korea
  • Type

    conf

  • DOI
    10.1109/STSM.1994.836008
  • Filename
    836008