DocumentCode :
1909647
Title :
The electrical characteristic dependence of reactive plasma evaporated copper phthalocyamne film on the NO/sub x/ gas absorption.
Author :
Choi, C.G. ; Lee, W.J. ; Lee, S.C.
Author_Institution :
KAIST
fYear :
1994
fDate :
24-29 July 1994
Firstpage :
637
Lastpage :
637
Keywords :
Copper; Electric variables; Gas detectors; Metal-insulator structures; Plasma materials processing; Plasma measurements; Plasma properties; Schottky diodes; Semiconductor diodes; Semiconductor films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Science and Technology of Synthetic Metals, 1994. ICSM '94. International Conference on
Conference_Location :
Seoul, Korea
Type :
conf
DOI :
10.1109/STSM.1994.836008
Filename :
836008
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1909647
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