DocumentCode :
1909669
Title :
Investigation of the influence of impact ionization feedback on the spatial distribution of hot carriers in an NMOSFET
Author :
Jungemann, C. ; Yamaguchi, Satarou ; Goto, H.
Author_Institution :
Fujitsu Limited, Kawasaki, Japan and University of Bremen, Germany
fYear :
1997
fDate :
22-24 September 1997
Firstpage :
336
Lastpage :
339
Keywords :
Charge carrier processes; Electrons; Feedback; Hot carriers; Impact ionization; MOSFET circuits; Particle scattering; Probability; Silicon; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
Type :
conf
DOI :
10.1109/ESSDERC.1997.194434
Filename :
1503364
Link To Document :
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