Comparison of field electron emission from carbon nanotube films produced by different techniques

Author

Karabutov, A.V. ; Konov, V.I. ; Obraztsova, E.D. ; Pereverzev, V.G. ; Pimenov, S.M. ; Pozharov, A.S. ; Terekhov, S.V. ; Detkov, P.Y. ; Shorokhov, E.V. ; Loubnin, E.N.

Author_Institution

Gen. Phys. Inst., Moscow, Russia

fYear

2003

fDate

7-11 July 2003

Firstpage

231

Lastpage

232

Abstract

In this paper we study the field electron emission properties of CNT films produced by different techniques on Si, metal and glass substrates: (i) electrophoretic deposition of single-wall and multiwall CNT onto conducting substrates from alcohol suspensions, (ii) catalytic pyrolysis of multiwall CNT, (iii) formation of CNT films on metal substrates by gas-static pressing, (iv) explosive implantation of CNT into metal layers, (v) shock-wave compacting of various powder materials with CNT, etc. In addition we study carbon nanoparticle-based emitters produced by electrochemical codeposition of metals with nanodiamond powders or chemical vapor deposited carbon ´needle-shaped´ nanostructures using a dc arc plasma activation of triple (methane-argon-nitrogen) gas mixtures.

Keywords

CVD coatings; carbon nanotubes; electron field emission; electrophoretic coatings; nanoparticles; thin films; C; CNT films; Si; alcohol suspensions; carbon nanoparticle-based emitters; carbon nanotube films; catalytic pyrolysis; conducting substrates; dc arc plasma activation; electrochemical codeposition; electrophoretic deposition; explosive implantation; field electron emission; gas mixtures; gas-static pressing; glass substrates; metal layers; multiwall CNT; nanodiamond powders; needle-shaped nanostructures; shock-wave compacting; single-wall CNT; Carbon dioxide; Carbon nanotubes; Conductive films; Electron emission; Explosives; Glass; Powders; Pressing; Semiconductor films; Suspensions;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International

Conference_Location

Osaka, Japan

Print_ISBN

4-8181-9515-4

Type

conf

DOI

10.1109/IVMC.2003.1223068

Filename

1223068