Title :
Investigation of the effect of the extension implant energy on deep submicron CMOS device performance
Author :
Kubicek, Stefan ; Biesemans, Serge ; De Meyer, Kristin
Author_Institution :
IMEC, Belgium
fDate :
22-24 September 1997
Keywords :
Degradation; Doping; Implants; Indium; Ion implantation; MOS devices; MOSFET circuits; Process control; Silicon; Ultra large scale integration;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194448
