• DocumentCode
    1910085
  • Title

    Investigation of the effect of the extension implant energy on deep submicron CMOS device performance

  • Author

    Kubicek, Stefan ; Biesemans, Serge ; De Meyer, Kristin

  • Author_Institution
    IMEC, Belgium
  • fYear
    1997
  • fDate
    22-24 September 1997
  • Firstpage
    392
  • Lastpage
    395
  • Keywords
    Degradation; Doping; Implants; Indium; Ion implantation; MOS devices; MOSFET circuits; Process control; Silicon; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1997. Proceeding of the 27th European
  • Print_ISBN
    2-86332-221-4
  • Type

    conf

  • DOI
    10.1109/ESSDERC.1997.194448
  • Filename
    1503378
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1910085