Title :
Improvement in electron emission from CNT cathodes after Ar plasma treatment
Author :
Kanazawa, Y. ; Oyama, T. ; Murakami, K. ; Takai, M.
Author_Institution :
Res. Center for Mater. Sci. at Extreme Conditions, Osaka Univ., Toyonaka, Japan
Abstract :
In this paper, CNT cathodes were exposed to Ar plasma in order to improve emission characteristics presumably due to the formation of dangling bonds by cutting CNT´s bundle using ions from Ar plasma.
Keywords :
carbon nanotubes; cathodes; dangling bonds; electron field emission; plasma materials processing; Ar plasma treatment; C; carbon nanotube cathode; dangling bonds; electron emission; emission properties; Argon; Cathodes; Electron emission; Nuclear and plasma sciences; Plasma displays; Plasma materials processing; Plasma measurements; Plasma properties; Printing; Scanning electron microscopy;
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
DOI :
10.1109/IVMC.2003.1223082
