DocumentCode
1910484
Title
The effect of plasma treatment on the field emission characteristics of printed MWCNT display panel
Author
Tsang-Lang Lin ; Ming-Li Liu ; Leou, K.-C. ; Yuan Hu ; Tsai, C.-H.
Author_Institution
Dept. of Eng. & Syst. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2003
fDate
7-11 July 2003
Firstpage
265
Lastpage
266
Abstract
In this paper, the field emission characteristics were investigated for the printed MWCNT display panels. The effect of plasma treatment on the field emission characteristics was investigated in-situ in a vacuum chamber equipped with a inductively coupled plasma source. The field emission current was measured typically at a gap distance of 70 microns and at pressures around 10/sup -6/ torr.
Keywords
carbon nanotubes; field emission displays; nanotube devices; plasma materials processing; 10/sup -6/ torr; 70 micron; C; field emission current; field emission properties; inductively coupled plasma source; plasma treatment; printed MWCNT display panel; vacuum chamber; Argon; Cathodes; Current measurement; Flat panel displays; Low voltage; Plasma displays; Plasma measurements; Plasma properties; Plasma sources; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location
Osaka, Japan
Print_ISBN
4-8181-9515-4
Type
conf
DOI
10.1109/IVMC.2003.1223085
Filename
1223085
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