Title :
A new cellular etching-simulator for InP and Si
Author :
Wehmann, H-H ; Chahoud, M. ; Schlachetzki, A.
Author_Institution :
Technische Universit¨at Braunschweig, Germany
fDate :
22-24 September 1997
Keywords :
Anisotropic magnetoresistance; Computational modeling; Crystallography; Etching; Graphics; Indium phosphide; Rough surfaces; Solid modeling; Substrates; Surface roughness;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194470
