• DocumentCode
    1910717
  • Title

    A new cellular etching-simulator for InP and Si

  • Author

    Wehmann, H-H ; Chahoud, M. ; Schlachetzki, A.

  • Author_Institution
    Technische Universit¨at Braunschweig, Germany
  • fYear
    1997
  • fDate
    22-24 September 1997
  • Firstpage
    480
  • Lastpage
    483
  • Keywords
    Anisotropic magnetoresistance; Computational modeling; Crystallography; Etching; Graphics; Indium phosphide; Rough surfaces; Solid modeling; Substrates; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1997. Proceeding of the 27th European
  • Print_ISBN
    2-86332-221-4
  • Type

    conf

  • DOI
    10.1109/ESSDERC.1997.194470
  • Filename
    1503400
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1910717