• DocumentCode
    1910923
  • Title

    Source/Drain Engineering with Ge Large Angle Tilt Implantation and Pre-Amorphization to Improve Currrent Drive and Alleviate Floating Body Effects of Thin Film SOI MOSFETs

  • Author

    Hsiao, Tommy C. ; Liu, Ping ; Lynch, William T. ; Woo, Jason C S

  • Author_Institution
    dvancedMicro Devices Inc., USA
  • fYear
    1997
  • fDate
    22-24 September 1997
  • Firstpage
    516
  • Lastpage
    519
  • Keywords
    Etching; Length measurement; MOSFETs; Semiconductor thin films; Silicidation; Silicides; Silicon; Thin film devices; Transistors; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1997. Proceeding of the 27th European
  • Print_ISBN
    2-86332-221-4
  • Type

    conf

  • DOI
    10.1109/ESSDERC.1997.194479
  • Filename
    1503409
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1910923