DocumentCode
1910943
Title
Design and simulation of stabilized Z-pinch loads with tailored density profiles
Author
Velikovich, A.L. ; Cochran, F.L. ; Davis, J.
Author_Institution
Berkeley Res. Associates, Springfield, VA, USA
fYear
1997
fDate
19-22 May 1997
Firstpage
273
Abstract
Summary form only given. We discuss the design of structured Z-pinch loads capable of mitigating the detrimental effect of Rayleigh-Taylor (RT) instability on the performance of fast Z-pinch devices used as plasma radiation sources. We demonstrate that using a structured gaseous load with a radial density profile specifically tailored for a given current wave form, it is possible to delay the onset of the RT instability development for as long as it takes for a shock wave to propagate through the load. Suppression of the RT instability is due to inverted acceleration of the interface between magnetic field and the plasma. Once the acceleration is inverted, perturbations are shown to oscillate rather than to grow exponentially. Our simulation results indicate the possibility of high-quality implosions producing significant Ar K-shell yield from initial radii in the range between 4 and 8 cm, with current pulse duration of 250 ns and longer. The stabilizing effects of current pulse shape (the higher the current rise rate, the better), of the axial (the hourglass effect) and the azimuthal (current switching) density tailoring will be also discussed.
Keywords
Rayleigh-Taylor instability; Z pinch; plasma density; plasma instability; plasma simulation; 250 ns; 4 to 8 cm; Ar; Ar K-shell yield; Rayleigh-Taylor instability; current switching; design; fast Z-pinch devices; hourglass effect; inverted acceleration; plasma radiation sources; shock wave; simulation; stabilized Z-pinch loads; structured gaseous load; tailored density profiles; Acceleration; Magnetic fields; Plasma accelerators; Plasma density; Plasma devices; Plasma simulation; Plasma sources; Plasma waves; Propagation delay; Shock waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location
San Diego, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3990-8
Type
conf
DOI
10.1109/PLASMA.1997.605054
Filename
605054
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