NO/sub 2/ interaction with thin films of phthalocyanine derivatives

Summary form only given. Nitrogen dioxode (NO2) interaction with thin films (100-2000 A) of cobalt (PcCo) and copper (PcCu) phthalocyanines and their derivatives of the common formula HalxPcM (Hal=Cl,Br; x=0,2,4,12.-13115-16; M=Co,Cu) has been studied. Formation of pi-cationradical forms for PcCo at low N02 pressures and for PcCu at higher ones is shown with IR and electron spectroscopy techniques; reversibility of the above processes is studied. Simultaneously parallel measurements of conductivity and sorption have been carried out and correlations of conductivity and N(NO2) in the films have been obtained. Controlled variation of properties of Pc-films by chemical modifying of PcCo and PcCu is forwarded, e.g. halogenization of macrolygand periphery is utilized. It is shown, that studied parameters an expressed and unequivocal dependence on the thickness of Pc-layer and the corresponding structural explanation is forwarded.