Title :
A 60-GHz efficiency-enhanced on-chip dipole antenna using helium-3 ion implantation process
Author :
Rui Wu ; Wei Deng ; Sato, Shinji ; Hirano, Takuichi ; Ning Li ; Inoue, Takeshi ; Sakane, Hitoshi ; Okada, Kenichi ; Matsuzawa, Akira
Author_Institution :
Tokyo Inst. of Technol., Tokyo, Japan
Abstract :
A 60-GHz CMOS on-chip dipole antenna with efficiency-enhancement technique is presented. A helium-3 ion irradiation process is used to reduce the substrate losses of the on-chip antenna. The radiation efficiency of the antenna is doubled using the ion implantation technique. The antenna is fabricated in a 65-nm CMOS technology with a core area of 0.48 mm2. The on-chip antenna achieves a peak gain of -4.1 dBi at 60GHz and a gain fluctuation of around ±1dB from 57 GHz to 67GHz.
Keywords :
CMOS integrated circuits; antenna radiation patterns; dipole antennas; helium; ion implantation; millimetre wave antennas; system-on-chip; CMOS on-chip dipole antenna efficiency enhancement technique; antenna radiation efficiency; frequency 57 GHz to 67 GHz; gain fluctuation; helium-3 ion implantation process; helium-3 ion irradiation process; peak gain; size 65 nm; substrate loss reduction; Antenna measurements; CMOS integrated circuits; Dipole antennas; Gain; Ion implantation; Radiation effects; System-on-chip; CMOS; Millimeter-wave; efficiency-enhanced; helium-3 ion implantation; on-chip dipole antenna;
Conference_Titel :
Microwave Conference (EuMC), 2014 44th European
Conference_Location :
Rome
DOI :
10.1109/EuMC.2014.6986381
