DocumentCode :
1911824
Title :
Random Telegraph Signal related low-frequency noise peaks in submicrometer Si MOST´s
Author :
Simoen, E. ; Dierickx, B. ; Claeys, C.
Author_Institution :
IMEC, Leuven, Belgium
fYear :
1993
fDate :
13-16 Sept. 1993
Firstpage :
43
Lastpage :
46
Abstract :
This paper discusses die low-frequency noise behaviour corresponding to Random Telegraph Signals in submicrometer Si MOSTs. It is shown that when the noise spectral density is measured as a function of the gate voltage (linear operation) or of the drain voltage, peak-shaped features are generally obtained. This excess-noise peak can be used to identify the occurrence of RTS, for instance in Silicon-on-Insulator MOSTs, and is useful in extracting the RTS parameters, i.e. its capture and emission time constant and the amplitude.
Keywords :
MOSFET; elemental semiconductors; micrometry; semiconductor device noise; silicon; silicon-on-insulator; CMOS technology; RTS parameters; Si; drain voltage; excess-noise peak; gate voltage; low-frequency noise behaviour; metal-oxide-semiconductor transistor; noise spectral density measurement; peak-shaped feature; random telegraph signal; submicrometer MOST; CMOS technology; Density measurement; Frequency; Low-frequency noise; Noise level; Noise measurement; Physics; Silicon on insulator technology; Telegraphy; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
Conference_Location :
Grenoble
Print_ISBN :
2863321358
Type :
conf
Filename :
5435459
Link To Document :
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