DocumentCode
1911966
Title
Maintenance-free, high efficiency treatment system for acidic gases
Author
Fukumoto, Takaaki ; Yamazaki, Norio ; Tada, Masuo ; Ogino, Hiroshi
Author_Institution
Mitsubishi Electr. Corp., Kumamoto, Japan
fYear
1997
fDate
6-8 Oct 1997
Abstract
We developed a highly removal efficient wet scrubbing system for removing various acidic gases in waste gas emitted by the semiconductor and other chemical industries. Especially significant are our system´s high removal efficiency (>99%) and long-term maintenance free operation
Keywords
air pollution control; chemical industry; electronics industry; 99 percent; acidic gases; chemical industries; high efficiency treatment system; high removal efficiency; long term continuous operation; maintenance-free system; pollution control; semiconductor industries; single tower; toxic gases; waste gas; wet scrubbing system; Carbon dioxide; Chemical industry; Costs; Electronics industry; Gases; Maintenance; Poles and towers; Pollution control; Production facilities; Protection;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-3752-2
Type
conf
DOI
10.1109/ISSM.1997.664622
Filename
664622
Link To Document