Title :
A cost-effective methodology for a run-by-run EWMA controller
Author :
Guo, Ruey-Shan ; Li-Shia Huang ; Argon Chen ; Chen, Jin-Jug
Author_Institution :
Dept. of Ind. Manage., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
In this paper, we present a cost-effective methodology for a run-by-run EWMA controller. This controller is an integrated approach that combines the advantages of statistical process control and feedback control. It adjusts the equipment settings only when the control chart detects an abnormal trend. Using simulations, we take into consideration the control sensitivity, robustness, and adjustment number required to determine an optimal weight for a minimum cost. As the simulation results demonstrate, the cost-effective run-by-run controller is able to keep drifting process outputs close to the target with only few runs of adjustment
Keywords :
Monte Carlo methods; centralised control; controllability; cost optimal control; feedback; integrated circuit manufacture; moving average processes; robust control; statistical process control; Monte Carlo simulation; abnormal trend; adjustment number; continuous controller; control chart; control sensitivity; cost-effective methodology; detection and control methodology; drifting process outputs; equipment settings; exponentially weighted moving average algorithm; feedback control; integrated approach; minimum cost; optimal weight; robustness; run-by-run EWMA controller; statistical process control; wafer output; Control charts; Control systems; Current measurement; Feedback control; Predictive models; Process control; Semiconductor device modeling; Yttrium;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
DOI :
10.1109/ISSM.1997.664624
