A cost-effective methodology for a run-by-run EWMA controller

Author

Guo, Ruey-Shan ; Li-Shia Huang ; Argon Chen ; Chen, Jin-Jug

Author_Institution

Dept. of Ind. Manage., Nat. Taiwan Univ., Taipei, Taiwan

fYear

1997

fDate

6-8 Oct 1997

Abstract

In this paper, we present a cost-effective methodology for a run-by-run EWMA controller. This controller is an integrated approach that combines the advantages of statistical process control and feedback control. It adjusts the equipment settings only when the control chart detects an abnormal trend. Using simulations, we take into consideration the control sensitivity, robustness, and adjustment number required to determine an optimal weight for a minimum cost. As the simulation results demonstrate, the cost-effective run-by-run controller is able to keep drifting process outputs close to the target with only few runs of adjustment

Keywords

Monte Carlo methods; centralised control; controllability; cost optimal control; feedback; integrated circuit manufacture; moving average processes; robust control; statistical process control; Monte Carlo simulation; abnormal trend; adjustment number; continuous controller; control chart; control sensitivity; cost-effective methodology; detection and control methodology; drifting process outputs; equipment settings; exponentially weighted moving average algorithm; feedback control; integrated approach; minimum cost; optimal weight; robustness; run-by-run EWMA controller; statistical process control; wafer output; Control charts; Control systems; Current measurement; Feedback control; Predictive models; Process control; Semiconductor device modeling; Yttrium;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-3752-2

Type

conf

DOI

10.1109/ISSM.1997.664624

Filename

664624