DocumentCode
1912991
Title
Optimization of Critical Ion Implantation Steps in 0.18 um CMOS Technology
Author
Bourenkov, A. ; Wittl, J. ; Schwalke, U. ; Lorenz, J. ; Ryssel, H.
Author_Institution
Fraunhofer Institut f¨ur Integrierte Schaltungen, Erlangen, Germany
fYear
1998
fDate
8-10 Sept. 1998
Firstpage
92
Lastpage
95
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location
Bordeaux, France
Print_ISBN
2-86332-234-6
Type
conf
Filename
1503496
Link To Document