مرکز منطقه ای اطلاع رساني علوم و فناوري - Transport Properties of the SiO(2)/Ta(2)O(5) stack as Gate Dielectric in CMOS Processes

DocumentCode :

1913438

Title :

Transport Properties of the SiO(2)/Ta(2)O(5) stack as Gate Dielectric in CMOS Processes

Author :

Devoivre, T. ; Papadas, C. ; Ghibaudo, G. ; Pananakakis, G. ; Setton, M. ; Sandler, N.

Author_Institution :

SGS-THOMSON Microelectronics, Crolles, France

fYear :

1998

fDate :

8-10 Sept. 1998

Firstpage :

152

Lastpage :

155

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Solid-State Device Research Conference, 1998. Proceeding of the 28th European

Conference_Location :

Bordeaux, France

Print_ISBN :

2-86332-234-6

Type :

conf

Filename :

1503511

Link To Document :