• DocumentCode
    1913731
  • Title

    The impact of back bias on the floating body effect in UTBOX SOI devices for 1T-FBRAM memory applications

  • Author

    Andrade, M.G.C. ; Martino, J.A. ; Aoulaiche, M. ; Collaert, N. ; Simoen, E. ; Claeys, And C.

  • Author_Institution
    LSI/PSI, Univ. of Sao Paulo, Sao Paulo, Brazil
  • fYear
    2012
  • fDate
    14-17 March 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, the floating body effect used in one Transistor Floating Body Random Access Memory (1T-FBRAM) is experimentally investigated on Fully Depleted Ultra Thin Box Silicon On Insulator devices (FD UTBOX SOI). It is shown that using a positive back bias allows further scaling of 1T-FBRAM by increasing the current sense margin as well as the VG read window. Furthermore, the VD operating bias is reduced to the minimal drain voltage needed for impact ionization, which is beneficial for reliability.
  • Keywords
    impact ionisation; random-access storage; silicon-on-insulator; 1T-FBRAM memory applications; UTBOX SOI devices; back bias; drain voltage; floating body effect; fully depleted ultra thin box silicon on insulator devices; impact ionization; one transistor floating body random access memory; Films; Hysteresis; Logic gates; MOSFETs; Silicon; Silicon on insulator technology; Threshold voltage; SOI; UTBOX; back bias; floating body; memory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Devices, Circuits and Systems (ICCDCS), 2012 8th International Caribbean Conference on
  • Conference_Location
    Playa del Carmen
  • Print_ISBN
    978-1-4577-1116-9
  • Electronic_ISBN
    978-1-4577-1115-2
  • Type

    conf

  • DOI
    10.1109/ICCDCS.2012.6188907
  • Filename
    6188907