DocumentCode
1913731
Title
The impact of back bias on the floating body effect in UTBOX SOI devices for 1T-FBRAM memory applications
Author
Andrade, M.G.C. ; Martino, J.A. ; Aoulaiche, M. ; Collaert, N. ; Simoen, E. ; Claeys, And C.
Author_Institution
LSI/PSI, Univ. of Sao Paulo, Sao Paulo, Brazil
fYear
2012
fDate
14-17 March 2012
Firstpage
1
Lastpage
4
Abstract
In this paper, the floating body effect used in one Transistor Floating Body Random Access Memory (1T-FBRAM) is experimentally investigated on Fully Depleted Ultra Thin Box Silicon On Insulator devices (FD UTBOX SOI). It is shown that using a positive back bias allows further scaling of 1T-FBRAM by increasing the current sense margin as well as the VG read window. Furthermore, the VD operating bias is reduced to the minimal drain voltage needed for impact ionization, which is beneficial for reliability.
Keywords
impact ionisation; random-access storage; silicon-on-insulator; 1T-FBRAM memory applications; UTBOX SOI devices; back bias; drain voltage; floating body effect; fully depleted ultra thin box silicon on insulator devices; impact ionization; one transistor floating body random access memory; Films; Hysteresis; Logic gates; MOSFETs; Silicon; Silicon on insulator technology; Threshold voltage; SOI; UTBOX; back bias; floating body; memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Devices, Circuits and Systems (ICCDCS), 2012 8th International Caribbean Conference on
Conference_Location
Playa del Carmen
Print_ISBN
978-1-4577-1116-9
Electronic_ISBN
978-1-4577-1115-2
Type
conf
DOI
10.1109/ICCDCS.2012.6188907
Filename
6188907
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