• DocumentCode
    1914281
  • Title

    Spatial distribution of the high energy density plasma in a coaxial gun for surface modification

  • Author

    Ming-Fang Lu ; Si-Ze Yang ; Chi-Zi Liu

  • Author_Institution
    Inst. of Phys., Acad. Sinica, Beijing, China
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    280
  • Abstract
    Summary form only given. The coaxial plasma gun, by generating the pulsed High Energy Density Plasma (HEDP) with a simple method, is an effective method for materials surface modification. It incorporates fast quenching, ion implantation and film deposition into one process, and produces a modification layer of strongly adhesive to the substrate. The spatial distribution of the plasma stream ejected from the coaxial gun determines the surface modification. In this paper, this problem was investigated on a 40 kV gas-puff coaxial plasma gun by using thermal sensitive (Fax) paper and dosimeter.
  • Keywords
    ion implantation; plasma density; plasma deposited coatings; plasma diagnostics; plasma guns; plasma production; 1 atm; 10 to 100 mus; 10 to 20 eV; 17 cm; 25 to 30 kV; 4.5 muF; 40 kV; 7 cm; 8 cm; coaxial gun; dosimeter; fast quenching; film deposition; gas-puff coaxial plasma gun; high energy density plasma; ion implantation; materials surface modification; plasma stream; spatial distribution; surface modification; thermal sensitive paper; Coaxial components; Electrodes; Nuclear and plasma sciences; Physics; Plasma density; Plasma immersion ion implantation; Plasma materials processing; Pulse generation; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.605067
  • Filename
    605067