DocumentCode :
1914334
Title :
Study of NBTI Stress in P+-Poly PMOSFETs with Gate Oxides Grown on Nitrogen Implanted Si Substrates
Author :
Chen, Y.Y. ; Kwong, D.L. ; Gardner, M. ; Fulford, J.
Author_Institution :
The University of Texas, Austin, United States
fYear :
1998
fDate :
8-10 Sept. 1998
Firstpage :
292
Lastpage :
295
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location :
Bordeaux, France
Print_ISBN :
2-86332-234-6
Type :
conf
Filename :
1503546
Link To Document :
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