DocumentCode :
1914748
Title :
Bitline contacts in high density SRAMs: design for testability and stressability
Author :
Pilo, Harold ; Adams, R. Dean ; Busch, Robert E. ; Nelson, Erik A. ; Rudgers, George E.
Author_Institution :
Microelectron. Div., IBM Corp., Essex Junction, VT, USA
fYear :
2001
fDate :
2001
Firstpage :
776
Lastpage :
782
Abstract :
Process scaling and the need for smaller SRAM cells challenges process technologies to make millions of robust and reliable bitline contacts on a single chip. Another challenge is to identify marginal, resistive and unreliable bitline contacts given the inherent electrical characteristics of the SRAM cell. This paper describes two design techniques that improve the screenability and stressability of bitline contacts in high-density SRAMs. These techniques are developed to overcome the lack of detectability of resistive bitline contacts in SRAM cells
Keywords :
SRAM chips; contact resistance; design for testability; environmental stress screening; integrated circuit reliability; integrated circuit testing; bitline contacts; design for testability; design techniques; high density SRAMs; process scaling; resistive bitline contacts; screenability; six-transistor SRAM cell; stressability; unreliable bitline contact identification; Contact resistance; Current supplies; Design for testability; Electric variables; Microelectronics; Random access memory; Rivers; Robustness; Stability; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Conference, 2001. Proceedings. International
Conference_Location :
Baltimore, MD
ISSN :
1089-3539
Print_ISBN :
0-7803-7169-0
Type :
conf
DOI :
10.1109/TEST.2001.966699
Filename :
966699
Link To Document :
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