DocumentCode
1914920
Title
Raman scattering studies on Mn-doped GaN grown by metal organic chemical vapor deposition
Author
Cui, X.G.
Author_Institution
Dept. of Light Sources & Illuminating Eng., Fudan Univ., Shanghai, China
Volume
2
fYear
2011
fDate
20-22 May 2011
Firstpage
1773
Lastpage
1778
Abstract
Mn-doped GaN epitaxial films were grown by metal organic chemical vapor deposition (MOCVD). Appropriate growth conditions for the growth of high quality films were established by studying Raman scattering spectra of Mn-doped GaN films. And then at the optimal growth conditions, Mn-dopants levels were increased for the growth of heavily Mn-doped GaN films. We found that with increasing Mn-dopants levels, longitudinal optical phonon mode A1(LO) of films is broadened and shifts towards lower frequency. The possible reason derives from the different bonding strength between Ga-N pairs and Mn-N pairs in the host lattice. In addition, electronic property of Mn-doped GaN was studied. We found that the electronic property of GaN-based DMSs can be adjusted by p- and/or n-dopants.
Keywords
III-V semiconductors; MOCVD; Raman spectra; bonding processes; doping profiles; gallium compounds; heavily doped semiconductors; manganese; phonons; red shift; semiconductor epitaxial layers; semiconductor growth; semimagnetic semiconductors; wide band gap semiconductors; GaN:Mn; Raman scattering; bonding strength; dopant levels; electronic property; epitaxial film growth; heavily doped films; longitudinal optical phonon; metal organic chemical vapor deposition; Annealing; Artificial intelligence; Epitaxial growth; Manganese; X-ray scattering; MOCVD; Mn-doped GaN; Raman Scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Materials for Renewable Energy & Environment (ICMREE), 2011 International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-61284-749-8
Type
conf
DOI
10.1109/ICMREE.2011.5930678
Filename
5930678
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