Title :
YBaCuO thin film deposition by pulsed plasma discharges
Author :
Suda, Yoshiaki ; Nakazono, Takeshi ; Ebihara, Kenji
Author_Institution :
Sasebo Coll. of Technol., Nagasaki, Japan
Abstract :
A pulsed arc plasma discharge and off-axis magnetron sputtering were used to sputter YBa2Cu3O7-x bulk targets and deposit YBaCuO thin films on MgO (100) substrates without heating. The plasma properties and the film characteristics were investigated in connection with preparing the high-quality YBaCuO thin films. The films deposited by the pulsed arc plasma discharge method under the conditions P=8 torr, Ar:O2=4:1, V 0=0.8 kV and by off-axis magnetron sputtering under the conditions P=490 mtorr. Ar:O2=4:1, Vs =0.4~0.5 kV had almost stoichiometric composition. Y:Ba:Cu=1:(1.94~2.16):(2.76~3.56) and Y:Ba:Cu=1:(1.91~2.26):(2.29~3.26), respectively. In the off-axis magnetron sputtering, many spectral lines of YI, YII, BaI, BaII, and CuI were identified and the excitation temperature was found to be in the range of 2500~8600 K
Keywords :
barium compounds; copper compounds; high-temperature superconductors; sputter deposition; sputtered coatings; stoichiometry; superconducting thin films; yttrium compounds; 0.4 to 0.5 kV; 0.8 kV; 2500 to 8600 K; MgO; YBa2Cu3O7-x; YBaCuO; bulk targets; characteristics; excitation temperature; off-axis magnetron sputtering; pulsed plasma discharges; spectral lines; stoichiometric composition; substrates; thin film deposition; Chemical lasers; Magnetic separation; Optical films; Plasma chemistry; Plasma materials processing; Plasma properties; Plasma temperature; Sputtering; Superconducting magnets; Yttrium barium copper oxide;
Conference_Titel :
Industry Applications Society Annual Meeting, 1993., Conference Record of the 1993 IEEE
Conference_Location :
Toronto, Ont.
Print_ISBN :
0-7803-1462-X
DOI :
10.1109/IAS.1993.299088
