Title :
Impact of BF2 Implantation Dose of the Highly Doped Drains on Titanium Silicide Formation
Author :
Hendriks, M. ; van de Riet, E. ; Diekema, M.
Author_Institution :
Philips Semiconductors, Nijmegen, Netherlands
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location :
Bordeaux, France
Print_ISBN :
2-86332-234-6
