Title :
Switching comparison of generation 1 and generation 2P-MCTs and ultrafast N-IGBTs
Author :
Kendle, Paul D. ; Temple, V.A.K. ; Arthur, Stephen D.
Author_Institution :
Harris Semiconductor, Mountaintop, PA, USA
Abstract :
Measurements have been made evaluating the switching and conduction characteristics of the first commercially available 600-V MCT (MOS controlled thyristor), the second-generation, 600-V MCT still under development, and a fast commercially N-IGBT (insulated-gate bipolar transistor). The data presented indicate that great strides have been made in improving the electrical performance of the P-MCT in the generation 2 device. Using the fmax curve as a figure of merit, the lower switching losses of the N-IGBT are favorable, under the test conditions used, compared to the generation 1 P-MCT up to ~50 A. The lower conduction losses of the MCT become the predominant factor for larger current levels. The generation 2 P-MCT combines the same conduction loss characteristics as its predecessor, with drastic reductions in turn-off switching times and losses. The combined effect gives the generation 2 P-MCT the lowest losses over the whole current and frequency range evaluated. The N-IGBT provides a better safe operating area than either of the P-MCTs, though capacitive snubbers can be employed to improve this situation
Keywords :
insulated gate bipolar transistors; losses; metal-insulator-semiconductor devices; switching circuits; thyristors; 600 V; MOS controlled thyristor; P-MCT; capacitive snubbers; conduction characteristics; conduction loss characteristics; figure of merit; fmax curve; insulated-gate bipolar transistor; lower conduction losses; lower switching losses; safe operating area; switching characteristics; turn-off losses; turn-off switching times; ultrafast N-IGBT; Insulated gate bipolar transistors; MOSFETs; Plastic packaging; Resistors; Switches; Temperature control; Temperature measurement; Thermal resistance; Thyristors; Voltage;
Conference_Titel :
Industry Applications Society Annual Meeting, 1993., Conference Record of the 1993 IEEE
Conference_Location :
Toronto, Ont.
Print_ISBN :
0-7803-1462-X
DOI :
10.1109/IAS.1993.299098