Influence of Fluorinated Gate Oxides on the Low Frequency Noise of MOS Transistors under Analog Operation

Author

Brederlow, Ralf ; Weber, Werner ; Jurk, Reinhard ; Dahl, Claus ; Kessel, Sylvia ; Holz, Jürgen ; Sauert, Wolfgang ; Klein, Peter ; Lemaitre, Bernd ; Schmitt-Landsiede, D. ; Thewes, Roland

Author_Institution

Siemens AG, Munich, Germany

fYear

1998

fDate

8-10 Sept. 1998

Firstpage

472

Lastpage

475

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1998. Proceeding of the 28th European

Conference_Location

Bordeaux, France

Print_ISBN

2-86332-234-6

Type

Filename

1503591

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