DocumentCode :
1915683
Title :
Characterization of InAlAs/InGaAs HFETs with High Indium Content in the Channel Grown on GaAs Substrate
Author :
Rorsman, Niklas ; Karlsson, Christer ; Zirath, Herbert ; Wang, Shumin M. ; Andersson, Thorvald G.
Author_Institution :
Dept. of Microwave Technol., Chalmers Univ. of Technol., Goteborg, Sweden
fYear :
1993
fDate :
13-16 Sept. 1993
Firstpage :
765
Lastpage :
768
Abstract :
InAlAs/InGaAs HFETs having very high indium content (80 and 100%) in the channel have been fabricated on GaAs and electrically characterized. The extrinsic transconductance were 310 mS/mm (560 mS/mm at 77 K), and the saturation current were 700 mA/mm (600 mA/mm at 77 K) for an InAs channel. The value of fT and fmax for this device were measured to be 80 GHz and 50 GHz, respectively. The In0.8Ga0.2As channel material had extrinsic transconductance of 320 mS/mm (470 mS/mm at 77 K), and the saturation current were 520 mA/mm (440 mA/mm at 77K). The value of fT and fmax for this device were measured to be 80 GHz and 50 GHz, respectively.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor heterojunctions; GaAs substrate; HFET; InAlAs-InGaAs; channel growth; extrinsic transconductance; high indium content; saturation current; temperature 77 K; Electron mobility; Gallium arsenide; Gold; HEMTs; Indium compounds; Indium gallium arsenide; Lattices; MODFETs; Microwave technology; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
Conference_Location :
Grenoble
Print_ISBN :
2863321358
Type :
conf
Filename :
5435603
Link To Document :
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