DocumentCode :
1916104
Title :
Atmospheric pressure discharge plasma processing for gaseous air contaminants
Author :
Oda, Tetsuji ; Yamashita, Ryuichi ; Takahashi, Tadashi ; Masuda, Senichi
Author_Institution :
Dept. of Electr. Eng., Tokyo Univ., Japan
fYear :
1993
fDate :
2-8 Oct 1993
Firstpage :
1983
Abstract :
The authors investigated the decomposition performance of gaseous environmental destructive contaminants in air by using atmospheric-pressure discharge plasma including SPCP (surface discharge induced plasma chemical processing). Contaminants tested were chlorofluorocarbon (CFC-113) and trichloroethylene. The discharge exciting frequency range was wide, from 50 Hz to 50 kHz. Low-frequency discharge requires high voltage to inject high electric power into the gas and to decompose contaminants. A gaschromato mass spectrometer analyzed discharge products of dense CFC-113 or trichloroethylene, and HCl, CClFO, CHCl, etc. were detected as products. Two different electrode configurations, silent discharge (coaxial) electrode and coil electrode, were tested and compared
Keywords :
air pollution detection and control; plasma applications; surface discharges; 50 Hz to 50 kHz; CClFO; CFC-113; CHCl; HCl; atmospheric pressure; chlorofluorocarbon; coaxial electrodes; coil electrode; discharge plasma processing; environmental destructive contaminants; gaschromato mass spectrometer; gaseous air contaminants; low frequency discharge; plasma chemical processing; silent discharge electrodes; surface discharge; trichloroethylene; Atmospheric-pressure plasmas; Chemical processes; Electrodes; Frequency; Plasma chemistry; Plasma density; Plasma materials processing; Surface contamination; Surface discharges; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Society Annual Meeting, 1993., Conference Record of the 1993 IEEE
Conference_Location :
Toronto, Ont.
Print_ISBN :
0-7803-1462-X
Type :
conf
DOI :
10.1109/IAS.1993.299132
Filename :
299132
Link To Document :
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