• DocumentCode
    1916786
  • Title

    Photoluminescence of rapid-thermal annealed Mg-doped GaN films

  • Author

    Wang, L.S. ; Fong, W.K. ; Surya, C. ; Cheah, K.W. ; Eng, Zh ; Wang, Zhen

  • Author_Institution
    Dept. of Electron. & Inf. Eng., Hong Kong Polytech. Univ., Hong Kong
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    154
  • Lastpage
    157
  • Abstract
    We report investigation of temperature and excitation power dependencies in photoluminescence spectroscopy measured from Mg-doped GaN epitaxial layers grown on sapphire by metalorganic chemical vapor deposition. The objective is to examine the effects of rapid-thermal annealing on Mg related emissions. It is observed that the peak position of the 2.7~2.8 eV emission line is a function of the device temperature and detailed annealing procedure. The phenomenon is attributed to Coulomb-potential fluctuations in the conduction and valence bandedges and impurity levels due to the Mg-related complex dissociation. The blue shifts of the 2.7~2.8 eV emission lines with increasing excitation power provides clear evidence that donor-acceptor recombination process underlies the observed emission spectrum
  • Keywords
    III-V semiconductors; band structure; gallium compounds; impurity states; magnesium; photoluminescence; rapid thermal annealing; semiconductor epitaxial layers; wide band gap semiconductors; Al2O3; Coulomb-potential fluctuations; GaN:Mg; Mg related emissions; Mg-related complex dissociation; blue shifts; conduction band edge; device temperature; donor-acceptor recombination process; emission spectrum; epitaxial layers; excitation power dependence; impurity levels; metalorganic chemical vapor deposition; photoluminescence spectroscopy; rapid-thermal annealed Mg-doped GaN films; sapphire; temperature dependence; valence band edge; Annealing; Chemical vapor deposition; Epitaxial layers; Fluctuations; Gallium nitride; Impurities; Photoluminescence; Power measurement; Spectroscopy; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1999. Proceedings. 1999 IEEE Hong Kong
  • Conference_Location
    Shatin
  • Print_ISBN
    0-7803-5648-9
  • Type

    conf

  • DOI
    10.1109/HKEDM.1999.836429
  • Filename
    836429