• DocumentCode
    1917007
  • Title

    Physical study of RTP N2O-and NH3-nitrided thin SiO2 films

  • Author

    Bouvet, D. ; Clivaz, P.A. ; Almeida, J. ; Coluzza, C. ; Margaritondo, G. ; Letourneau, P. ; Dutoit, M. ; Dubois, C. ; Dupuy, J.C. ; Pio, F.

  • Author_Institution
    Swiss Federal Institute of Technology, CH 1015 Lausanne, Switzerland
  • fYear
    1994
  • fDate
    11-15 Sept. 1994
  • Firstpage
    29
  • Lastpage
    32
  • Keywords
    Chemical analysis; Electric variables measurement; Energy resolution; Etching; Interface states; Microelectronics; Microscopy; Nitrogen; Rapid thermal processing; Research and development;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
  • Conference_Location
    Edinburgh, Scotland
  • Print_ISBN
    0863321579
  • Type

    conf

  • Filename
    5435662
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1917007