Title :
High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology
Author :
Tan, F.S. ; Klunder, D.J.W. ; Kelderman, H. ; Hoekstra, H.J.W.M. ; Driessen, A.
Author_Institution :
Fac. of Appl. Phys. & Electr. Eng., Twente Univ., Enschede, Netherlands
Abstract :
A simple waveguiding structure with vertically coupled microring resonators has been realized. A finesse of more than 100 could be achieved by using Si3N4-SiO2 technology. The devices have been realized by means of standard optical lithography processes and reactive ion etching (RIE).
Keywords :
optical couplers; optical fabrication; optical resonators; photolithography; silicon compounds; sputter etching; RIE; Si3N4-SiO2; Si3N4-SiO2 technology; high finesse vertically coupled waveguide-microring resonators; reactive ion etching; simple waveguiding structure; standard optical lithography processes; Buffer layers; Lithography; Optical devices; Optical filters; Optical refraction; Optical resonators; Optical ring resonators; Optical sensors; Optical variables control; Optical waveguides;
Conference_Titel :
Fibre and Optical Passive Components, 2002. Proceedings of 2002 IEEE/LEOS Workshop on
Print_ISBN :
0-7803-7556-4
DOI :
10.1109/FOPC.2002.1015832
