• DocumentCode
    1917177
  • Title

    High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology

  • Author

    Tan, F.S. ; Klunder, D.J.W. ; Kelderman, H. ; Hoekstra, H.J.W.M. ; Driessen, A.

  • Author_Institution
    Fac. of Appl. Phys. & Electr. Eng., Twente Univ., Enschede, Netherlands
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    228
  • Lastpage
    232
  • Abstract
    A simple waveguiding structure with vertically coupled microring resonators has been realized. A finesse of more than 100 could be achieved by using Si3N4-SiO2 technology. The devices have been realized by means of standard optical lithography processes and reactive ion etching (RIE).
  • Keywords
    optical couplers; optical fabrication; optical resonators; photolithography; silicon compounds; sputter etching; RIE; Si3N4-SiO2; Si3N4-SiO2 technology; high finesse vertically coupled waveguide-microring resonators; reactive ion etching; simple waveguiding structure; standard optical lithography processes; Buffer layers; Lithography; Optical devices; Optical filters; Optical refraction; Optical resonators; Optical ring resonators; Optical sensors; Optical variables control; Optical waveguides;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Fibre and Optical Passive Components, 2002. Proceedings of 2002 IEEE/LEOS Workshop on
  • Print_ISBN
    0-7803-7556-4
  • Type

    conf

  • DOI
    10.1109/FOPC.2002.1015832
  • Filename
    1015832
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1917177