DocumentCode :
1917273
Title :
Reduced sidewall effects in SiGe-base bipolar transistors
Author :
Hueting, R.J.E. ; Slotboom, J.W.
Author_Institution :
ELMAT/DIMES, Delft University of Technology, Delft, The Netherlands
fYear :
1994
fDate :
11-15 Sept. 1994
Firstpage :
67
Lastpage :
70
Abstract :
In small Si bipolar transistors (BJTs) the sidewall effects play an important role. Extensive device simulations on Si/SiGe/Si heterojunction bipolar transistors (HBTs) and Si BJTs show that in the HBTs the sidewall current injection is strongly suppressed. Consequently, the current gain in the HBT keeps constant down to a much smaller emitter width (We ¿ 0.20 ¿m) than for a conventional Si transistor (We ¿ 0.60 ¿m). Although the ratio of the charge storage in the sidewall emitter-base region and charge storage in the intrinsic region is also much less in the HBT than it is in the BJT, the effect on the cutoff frequency is about the same just because of the suppressed current spreading.
Keywords :
Bipolar transistors; Context modeling; Cutoff frequency; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Laboratories; Medical simulation; Photonic band gap; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Conference_Location :
Edinburgh, Scotland
Print_ISBN :
0863321579
Type :
conf
Filename :
5435671
Link To Document :
بازگشت