• DocumentCode
    1917273
  • Title

    Reduced sidewall effects in SiGe-base bipolar transistors

  • Author

    Hueting, R.J.E. ; Slotboom, J.W.

  • Author_Institution
    ELMAT/DIMES, Delft University of Technology, Delft, The Netherlands
  • fYear
    1994
  • fDate
    11-15 Sept. 1994
  • Firstpage
    67
  • Lastpage
    70
  • Abstract
    In small Si bipolar transistors (BJTs) the sidewall effects play an important role. Extensive device simulations on Si/SiGe/Si heterojunction bipolar transistors (HBTs) and Si BJTs show that in the HBTs the sidewall current injection is strongly suppressed. Consequently, the current gain in the HBT keeps constant down to a much smaller emitter width (We ¿ 0.20 ¿m) than for a conventional Si transistor (We ¿ 0.60 ¿m). Although the ratio of the charge storage in the sidewall emitter-base region and charge storage in the intrinsic region is also much less in the HBT than it is in the BJT, the effect on the cutoff frequency is about the same just because of the suppressed current spreading.
  • Keywords
    Bipolar transistors; Context modeling; Cutoff frequency; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Laboratories; Medical simulation; Photonic band gap; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
  • Conference_Location
    Edinburgh, Scotland
  • Print_ISBN
    0863321579
  • Type

    conf

  • Filename
    5435671