DocumentCode
1917273
Title
Reduced sidewall effects in SiGe-base bipolar transistors
Author
Hueting, R.J.E. ; Slotboom, J.W.
Author_Institution
ELMAT/DIMES, Delft University of Technology, Delft, The Netherlands
fYear
1994
fDate
11-15 Sept. 1994
Firstpage
67
Lastpage
70
Abstract
In small Si bipolar transistors (BJTs) the sidewall effects play an important role. Extensive device simulations on Si/SiGe/Si heterojunction bipolar transistors (HBTs) and Si BJTs show that in the HBTs the sidewall current injection is strongly suppressed. Consequently, the current gain in the HBT keeps constant down to a much smaller emitter width (We ¿ 0.20 ¿m) than for a conventional Si transistor (We ¿ 0.60 ¿m). Although the ratio of the charge storage in the sidewall emitter-base region and charge storage in the intrinsic region is also much less in the HBT than it is in the BJT, the effect on the cutoff frequency is about the same just because of the suppressed current spreading.
Keywords
Bipolar transistors; Context modeling; Cutoff frequency; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Laboratories; Medical simulation; Photonic band gap; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Conference_Location
Edinburgh, Scotland
Print_ISBN
0863321579
Type
conf
Filename
5435671
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