Title :
Extending KrF Lithography to 0.13 um sub-8F2 DRAM Technology: The Importance of Lithography-Centric Design
Author :
Bukofsky, S. ; Thomas, A. ; Kunkel, G. ; Preuninger, J.
Author_Institution :
IBM Microelectronics, Hopewell Junction, NY, USA
fDate :
11-13 September 2000
Keywords :
Capacitors; Lenses; Lithography; Microelectronics; Process design; Random access memory; Resists; Sorting; Space technology; Testing;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194747
