Title :
IC-Compatible Two-level Bulk Micromachining for RF Silicon Technology
Author :
Pham, N.P. ; Sarro, P.M. ; Ng, K.T. ; Burghartz, J.N.
Author_Institution :
Delft University of Technology, The Netherlands
fDate :
11-13 September 2000
Keywords :
Etching; Fabrication; Inductors; Integrated circuit technology; Micromachining; Microstrip; Plasma applications; Radio frequency; Radiofrequency integrated circuits; Silicon;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194750
