Title :
Copper Drifts in Porous Methylsilsesquiazane Low-k Dielectric Films
Author :
Kikkawa, T. ; Mukaigawa, S. ; Oda, T. ; Aoki, T. ; Shimizu, Y.
Author_Institution :
Hiroshima University, Higashi-Hiroshima, Japan
fDate :
11-13 September 2000
Keywords :
Capacitors; Copper; Dielectric constant; Dielectric films; Dielectric measurements; Dielectric substrates; Electric resistance; Integrated circuit interconnections; Leakage current; Ultra large scale integration;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194751
