DocumentCode :
1918189
Title :
High Current Gain Lateral Bipolar Action in DMOS Transistors
Author :
Edholm, B. ; Olsson, J. ; Söderbärg, A. ; Bohlin, K. ; Magnusson, F.
Author_Institution :
Dep. of Technology, Electronics, Uppsala University, P. O. Box 534, S-751 21, Uppsala, Sweden
fYear :
1994
fDate :
11-15 Sept. 1994
Firstpage :
221
Lastpage :
224
Abstract :
This paper describes a new operation mode of the DMOS transistor. By utilizing the diffused channel region as base and connecting it to the gate, hybrid lateral bipolar operation is obtained in the device. Current gain higher than 2000 and a cut-off frequency of 1.6 GHz are achieved. Superior breakdown voltages were obtained compared to previously published hybrid devices. It is demonstrated that hybrid operation of a DMOS transistor is a simple way to implement a high gain lateral bipolar transistor, without complex sub-¿ processing.
Keywords :
Bipolar integrated circuits; Bipolar transistors; Charge carrier processes; Cutoff frequency; Doping; Hybrid integrated circuits; Joining processes; MOSFETs; Manufacturing processes; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Conference_Location :
Edinburgh, Scotland
Print_ISBN :
0863321579
Type :
conf
Filename :
5435706
Link To Document :
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