• DocumentCode
    1918958
  • Title

    Investigation of the suitability of spike anneal for advanced CMOS technology

  • Author

    Lenoble, D. ; Josse, E. ; Grouillet, A. ; Arnaud, F. ; Julien, C. ; Skotnicki, T. ; Haond, M.

  • Author_Institution
    France Telecom, Meylan, France
  • fYear
    2000
  • fDate
    11-13 September 2000
  • Firstpage
    392
  • Lastpage
    395
  • Keywords
    Annealing; CMOS process; CMOS technology; Degradation; Electric resistance; Electrical resistance measurement; MOS devices; MOSFET circuits; Microelectronics; Telecommunications;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2000. Proceeding of the 30th European
  • Print_ISBN
    2-86332-248-6
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2000.194797
  • Filename
    1503727
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1918958