Title :
Using Ge pre-amorphisation and spike annealing for optimizing shallow junctions in deep-submicron CMOS
Author :
Meyssen, V.M.H. ; Stolk, P.A. ; van Zijl, J.P. ; van Berkum, J.G.M.
Author_Institution :
Philips Research Laboratories, Eindhoven, The Netherlands
fDate :
11-13 September 2000
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194798
