Title :
Ultra-Thin High Quality Oxynitride Formed by NH3 Nitridation and High Pressure O2 Re-oxidation
Author :
Luo, T.Y. ; Watt, V.H.C. ; Al-Shareef, H.N. ; Brown, G.A. ; Karamcheti, A. ; Jackson, M.D. ; Huff, H.R. ; Evans, B. ; Kwong, D.L.
Author_Institution :
University of Texas at Austin, Austin, TX, USA
fDate :
11-13 September 2000
Keywords :
Boron; Dielectrics; Electrodes; Furnaces; Leakage current; MOSFETs; Nitrogen; Silicon; Temperature; Thickness measurement;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194800
