Title :
A GaAs Device Isolation Technique by Liquid Phase Chemical-Enhanced Oxidation
Author :
Wang, H.H. ; Chou, D.W. ; Wu, J.Y. ; Wang, Y.H. ; Houng, M.P.
Author_Institution :
National Cheng-Kung University, Tainan, Taiwan
fDate :
11-13 September 2000
Keywords :
Chemicals; Etching; Gallium arsenide; Oxidation;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194807
