DocumentCode
1919656
Title
P2–12: The field emission behavior of nano-patchwork cathodes
Author
Binh, Vu Thien ; Mouton, Romain ; Adessi, Christophe ; Semet, Vincent ; Cahay, Marc ; Fairchild, Steven
Author_Institution
Equipe Emission Electron., Univ. of Lyon 1, Villeurbanne, France
fYear
2010
fDate
26-30 July 2010
Firstpage
145
Lastpage
146
Abstract
A numerical calculation of the patch-field distribution across nano-patchwork surfaces has been developed. Results show that the low work function nanosize zones are intrinsically protected by an electrostatic screen, which is induced by the surrounding area having higher work function. In presence of an applied field, during field emission, a preferential opening of the surface barrier just over the nano-patches induces a field emission array of parallel e-beams whose geometrical distribution is defined by the positions of the nano-patches.
Keywords
cathodes; nanostructured materials; numerical analysis; electrostatic screen; field emission behavior; geometrical distribution; low work function nanosize zones; nano-patches; nano-patchwork cathodes; nano-patchwork surfaces; numerical calculation; parallel e-beams; patch-field distribution; Book reviews; Cathodes; Electric potential; Electrostatics; Iron; Materials; Sea surface; field emission; low work-function; patch-field; patchwork cathodes;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location
Palo Alto, CA
Print_ISBN
978-1-4244-7889-7
Electronic_ISBN
978-1-4244-7888-0
Type
conf
DOI
10.1109/IVNC.2010.5563154
Filename
5563154
Link To Document