DocumentCode :
1919673
Title :
P2–13: Field emission characteristics of carbon nanotube forest on etched Si substrate
Author :
Lee, Jungwoo ; Park, Taehee ; Lee, Jongtaek ; Ahn, Juwon ; Shin, Mingyeong ; Yi, Whikun
Author_Institution :
Dept. of Chem., Hanyang Univ., Seoul, South Korea
fYear :
2010
fDate :
26-30 July 2010
Firstpage :
147
Lastpage :
148
Abstract :
In this work, we investigate the field emission characteristics of carbon nanotube forest on three types substrate: (1) mirror polished, (2) chemically etched (large pattern) and (3) chemically etched (small pattern) Si substrate. The surface morphology of CNTs forest was characterized by scanning electron microscopy (SEM), surface chemical state and electronic structure phase analyzed by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy.
Keywords :
Raman spectroscopy; X-ray photoelectron spectra; carbon nanotubes; etching; field emission; polishing; scanning electron microscopy; surface morphology; C; Raman spectroscopy; Si; X-ray photoelectron spectroscopy; carbon nanotube forest; chemical etching; electronic structure; field emission; mirror polishing; scanning electron microscopy; surface chemical state; surface morphology; Carbon nanotubes; Inductors; Iron; Mirrors; Morphology; Silicon; Substrates; Field emission; carbon nanotube; chemical etched Si substrate;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location :
Palo Alto, CA
Print_ISBN :
978-1-4244-7889-7
Electronic_ISBN :
978-1-4244-7888-0
Type :
conf
DOI :
10.1109/IVNC.2010.5563155
Filename :
5563155
Link To Document :
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