DocumentCode :
1919868
Title :
ESD protection in deep submicron CMOS technology -- Does the transient matter?
Author :
Cheung, Kin P. ; Kamgar, Avid
Author_Institution :
Bell Laboratories, Murray Hill, NJ, USA
fYear :
2000
fDate :
11-13 September 2000
Firstpage :
524
Lastpage :
527
Keywords :
Breakdown voltage; CMOS technology; Degradation; Electric breakdown; Electrostatic discharge; Lead compounds; Protection; Pulse shaping methods; Semiconductor device measurement; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
Type :
conf
DOI :
10.1109/ESSDERC.2000.194830
Filename :
1503760
Link To Document :
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