Title :
P1.4: Field effect controlled lateral field emission triode
Author :
Palma, John F. ; Mil´Shtein, Samson
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Massachusetts, Lowell, MA, USA
Abstract :
Lateral field emission transistors show promise for many high frequency and high power applications. Typical lateral devices place a gate roughly in between the cathode tip and the anode. While effective, such devices require large gate voltages for device control. This study proposes relocating the gate to on top of the semiconductor cathode stem, behind its emitting tip, allowing field effect control of the transistor. Both enhancement and depletion mode are possible, and the gate bias range needed for control becomes an easily designed parameter. Example structures are modeled where this range is about a volt. Relocation of the gate has the additional benefit of simplifying the region between the anode and cathode tip, thus opening up the possibility of shrinking their spacing.
Keywords :
electron field emission; field effect transistors; triodes; vacuum microelectronics; depletion mode; emitting tip; enhancement mode; field effect controlled lateral field emission triode; lateral field emission transistors; semiconductor cathode stem; vacuum microelectronics; Anodes; Cathodes; Doping; FETs; Logic gates; Semiconductor diodes; FETs; electron emission; field emission; vacuum microelectronics;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location :
Palo Alto, CA
Print_ISBN :
978-1-4244-7889-7
Electronic_ISBN :
978-1-4244-7888-0
DOI :
10.1109/IVNC.2010.5563165