DocumentCode :
1920170
Title :
P1–20: Specifying the necessary conditions for cloverleaf patterns formation in field emission microscope
Author :
Neo, Yoichiro ; Matsumoto, Takahiro ; Tomita, Makoto ; Sasaki, Masahiro ; Aoki, Toru ; Mimura, Hidenori ; Yokoo, Kuniyoshi
Author_Institution :
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
fYear :
2010
fDate :
26-30 July 2010
Firstpage :
67
Lastpage :
68
Abstract :
The cloverleaf patterns, which were firstly discovered by using field emission microscope in 1950, have been still mysterious and its formation mechanism remained unsolved for 60 years. In this report, it was described that our group successfully specified the necessary conditions in order to observe the cloverleaf pattern. In results, it was cleared that molecule orbital, adsorption state and electron beam induced modulation play the important roles to form cloverleaf patterns.
Keywords :
field emission electron microscopy; cloverleaf patterns formation; electron beam induced modulation; field emission microscope; formation mechanism; Cathodes; Electron microscopy; Finite element methods; Gases; Hydrocarbons; Tungsten; π-bond; σ-bond; adsorption; cloverleaf pattern; field emission microscope; field ion microscope;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location :
Palo Alto, CA
Print_ISBN :
978-1-4244-7889-7
Electronic_ISBN :
978-1-4244-7888-0
Type :
conf
DOI :
10.1109/IVNC.2010.5563176
Filename :
5563176
Link To Document :
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