P1–20: Specifying the necessary conditions for cloverleaf patterns formation in field emission microscope

Author

Neo, Yoichiro ; Matsumoto, Takahiro ; Tomita, Makoto ; Sasaki, Masahiro ; Aoki, Toru ; Mimura, Hidenori ; Yokoo, Kuniyoshi

Author_Institution

Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan

fYear

2010

fDate

26-30 July 2010

Firstpage

67

Lastpage

68

Abstract

The cloverleaf patterns, which were firstly discovered by using field emission microscope in 1950, have been still mysterious and its formation mechanism remained unsolved for 60 years. In this report, it was described that our group successfully specified the necessary conditions in order to observe the cloverleaf pattern. In results, it was cleared that molecule orbital, adsorption state and electron beam induced modulation play the important roles to form cloverleaf patterns.

Keywords

field emission electron microscopy; cloverleaf patterns formation; electron beam induced modulation; field emission microscope; formation mechanism; Cathodes; Electron microscopy; Finite element methods; Gases; Hydrocarbons; Tungsten; π-bond; σ-bond; adsorption; cloverleaf pattern; field emission microscope; field ion microscope;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International

Conference_Location

Palo Alto, CA

Print_ISBN

978-1-4244-7889-7

Electronic_ISBN

978-1-4244-7888-0

Type

conf

DOI

10.1109/IVNC.2010.5563176

Filename

5563176