DocumentCode :
1920294
Title :
P1–18: I-V Characteristics of nanogap electrodes formed by thermally assisted electromigration
Author :
Singh, Abhishek Kumar ; Rajput, Nitul Singh ; Banerjee, Amit ; Kulkarni, Vishwas N. ; Kumar, Jitendra
Author_Institution :
Mater. Sci. Programme, Indian Inst. of Technol. Kanpur, Kanpur, India
fYear :
2010
fDate :
26-30 July 2010
Firstpage :
64
Lastpage :
64
Abstract :
Electrodes with nano-scale gaps have been fabricated using metallic nano-wires, derived via milling of thin films with focused ion beam (FIB) and passing current ~1012A/m2. Their I-V characteristics measured at a pressure ~10-6 mbar are shown to follow Child-Langmuir law or Fowler-Nordheim field emission depending upon the gap.
Keywords :
electrodes; electromigration; field emission; focused ion beam technology; milling; nanofabrication; nanowires; Child-Langmuir law; Fowler-Nordheim field emission; focused ion beam; metallic nanowires; nanogap electrodes; thermally assisted electromigration; thin films; Copper; Electrodes; Gold; Ion beams; Lithography; Nanowires; Voltage measurement; Electro-migration; Focused Ion Beam (FIB); Nano-electrodes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location :
Palo Alto, CA
Print_ISBN :
978-1-4244-7889-7
Electronic_ISBN :
978-1-4244-7888-0
Type :
conf
DOI :
10.1109/IVNC.2010.5563181
Filename :
5563181
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1920294
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